DOSIMETRIC SILICA FILMS - THE INFLUENCE OF FIELDS ON THE CAPTURE OF POSITIVE CHARGE

被引：9

作者：

HOLMESSIEDLE, A ^{[1
]}

ADAMS, L ^{[1
]}

机构：

[1] EUROPEAN SPACE AGCY,ESTEC,BOX 299,2200 AG NOORDWIJK,NETHERLANDS

来源：

IEEE TRANSACTIONS ON NUCLEAR SCIENCE | 1982年 / 29卷 / 06期

关键词：

D O I：

10.1109/TNS.1982.4336481

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1975 / 1979

页数：5

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