CHLOROMETHYLATED POLYSTYRENE AS DEEP UV AND X-RAY RESIST

被引：24

作者：

IMAMURA, S

SUGAWARA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1982年 / 21卷 / 05期

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D O I：

10.1143/JJAP.21.776

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：776 / 782

页数：7

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[1] AGNIHOTRI RK, 1971, PHOTOGR SCI ENG, V15, P141
[2] Charlesby A., 1960, ATOMIC RAD POLYM
[3] OXYGEN CONSUMPTION DURING INDUCTION PERIOD OF A PHOTOPOLYMERIZING SYSTEM
CHONG, JS
[J]. JOURNAL OF APPLIED POLYMER SCIENCE, 1969, 13 (01) : 241 - &
[4] INFLUENCE OF OXYGEN ON PHOTOSENSITIVITY AND PICTURE QUALITY OF KTFR LACQUER
FROSCHLE, E
BACKHUS, R
[J]. SOLID-STATE ELECTRONICS, 1971, 14 (02) : 95 - &
[5] HIRATA H, 1980, TECH DIG IEEE INT EL, P405
[6] HIGH-PERFORMANCE ELECTRON NEGATIVE RESIST, CHLOROMETHYLATED POLYSTYRENE - A STUDY ON MOLECULAR-PARAMETERS
IMAMURA, S
TAMAMURA, T
HARADA, K
SUGAWARA, S
[J]. JOURNAL OF APPLIED POLYMER SCIENCE, 1982, 27 (03) : 937 - 949
[7] POLY(VINYLETHERS) AS X-RAY RESISTS
IMAMURA, S
SUGAWARA, S
MURASE, K
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (07) : 1139 - 1140
[8] CHLOROMETHYLATED POLYSTYRENE AS A DRY ETCHING-RESISTANT NEGATIVE RESIST FOR SUB-MICRON TECHNOLOGY
IMAMURA, S
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (09) : 1628 - 1630
[9] PULSE-RADIOLYSIS STUDY OF FORMATION OF BENZYL RADICALS FROM BENZYL CHLORIDE IN CYCLOHEXANE IN GAS PHASE
JOHNSON, GRA
SAUER, MC
WARMAN, JM
[J]. JOURNAL OF CHEMICAL PHYSICS, 1969, 50 (11) : 4933 - &
[10] DEEP-UV CONFORMABLE-CONTACT PHOTOLITHOGRAPHY FOR BUBBLE CIRCUITS
LIN, BJ
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1976, 20 (03) : 213 - 221