EFFECTS AND BEHAVIOR OF ARSENIC DURING TITANIUM SILICIDATION BY HALOGEN LAMP ANNEALING

被引：3

作者：

OKAMOTO, T

TSUKAMOTO, K

SHIMIZU, M

MATSUKAWA, T

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 09期

关键词：

D O I：

10.1063/1.338960

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4530 / 4534

页数：5

共 22 条

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[8]

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