共 19 条
- [12] OHTA K, ISCC 80, P66
- [14] ELECTRON TRAPPING LEVELS IN RF-SPUTTERED TA2O5 FILMS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (04): : 1825 - 1830
- [18] THORNTON J, 1984, DEPOSITION TECHNOLOG
- [19] 1966, ENG PROPERTIES SELEC