ELECTRON TRAPPING LEVELS IN RF-SPUTTERED TA2O5 FILMS

[1] PHOTOCURRENT SPECTROSCOPY IN THIN-FILM INSULATORS - VOLTAGE DEPENDENCE OF EXTERNAL-CIRCUIT CURRENT [J]. PHYSICAL REVIEW B, 1974, 9 (04): : 1874 - 1883

[2] DIMARIA DJ, 1975, PHYS REV B, V12, P5023

[3] VARIABLE REFRACTIVE-INDEX AND BIREFRINGENT WAVEGUIDES BY SPUTTERING TANTALUM IN O2-N2 MIXTURES [J]. APPLIED OPTICS, 1975, 14 (09): : 2194 - 2198

[4] POSITIVE AND NEGATIVE CHARGING OF THERMALLY GROWN SIO2 INDUCED BY FOWLER-NORDHEIM EMISSION [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3491 - 3497

[5] HIGH-VOLTAGE THIN-FILM TRANSISTORS MANUFACTURED WITH PHOTOLITHOGRAPHY AND WITH TA2O5 AS THE GATE OXIDE [J]. THIN SOLID FILMS, 1979, 61 (02) : 259 - 264

[6] CHEMICAL VAPOR-DEPOSITION OF TANTALUM PENTOXIDE FILMS FOR METAL-INSULATOR-SEMICONDUCTOR DEVICES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (10) : 1570 - 1573

[7] KAPOOR VJ, 1977, J APPL PHYS, V48, P739, DOI 10.1063/1.323664

[8] THIN-FILM ELECTROLUMINESCENT DEVICE EMPLOYING TA2O5 RF SPUTTERED INSULATING FILM [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (07): : 1028 - 1031

[9] ELECTRONIC CHARGE TRAPPING IN CHEMICAL VAPOR-DEPOSITED THIN-FILMS OF AL2O3 ON SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (11) : 4631 - &

[10] MEINERS LG, 1977, J VAC SCI TECHNOL, V14, P761

[1] PHOTOCURRENT SPECTROSCOPY IN THIN-FILM INSULATORS - VOLTAGE DEPENDENCE OF EXTERNAL-CIRCUIT CURRENT [J]. PHYSICAL REVIEW B, 1974, 9 (04): : 1874 - 1883

[2] DIMARIA DJ, 1975, PHYS REV B, V12, P5023

[3] VARIABLE REFRACTIVE-INDEX AND BIREFRINGENT WAVEGUIDES BY SPUTTERING TANTALUM IN O2-N2 MIXTURES [J]. APPLIED OPTICS, 1975, 14 (09): : 2194 - 2198

[4] POSITIVE AND NEGATIVE CHARGING OF THERMALLY GROWN SIO2 INDUCED BY FOWLER-NORDHEIM EMISSION [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (05) : 3491 - 3497

[5] HIGH-VOLTAGE THIN-FILM TRANSISTORS MANUFACTURED WITH PHOTOLITHOGRAPHY AND WITH TA2O5 AS THE GATE OXIDE [J]. THIN SOLID FILMS, 1979, 61 (02) : 259 - 264

[6] CHEMICAL VAPOR-DEPOSITION OF TANTALUM PENTOXIDE FILMS FOR METAL-INSULATOR-SEMICONDUCTOR DEVICES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (10) : 1570 - 1573

[7] KAPOOR VJ, 1977, J APPL PHYS, V48, P739, DOI 10.1063/1.323664

[8] THIN-FILM ELECTROLUMINESCENT DEVICE EMPLOYING TA2O5 RF SPUTTERED INSULATING FILM [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (07): : 1028 - 1031

[9] ELECTRONIC CHARGE TRAPPING IN CHEMICAL VAPOR-DEPOSITED THIN-FILMS OF AL2O3 ON SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1972, 43 (11) : 4631 - &

[10] MEINERS LG, 1977, J VAC SCI TECHNOL, V14, P761