ELECTROMIGRATION IN ALUMINUM THIN-FILMS UNDER PULSED-CURRENT CONDITIONS

被引：12

作者：

DAVIS, JR ^{[1
]}

机构：

[1] PO RES CTR,DIV SEMICOND COMPONENT RELIABIL,IPSWICH IP5 7RE,ENGLAND

来源：

PROCEEDINGS OF THE INSTITUTION OF ELECTRICAL ENGINEERS-LONDON | 1976年 / 123卷 / 11期

关键词：

D O I：

10.1049/piee.1976.0241

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

收藏

页码：1209 / 1212

页数：4

相关论文

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