ELECTROMIGRATION FAILURE IN A1 THIN-FILMS UNDER CONSTANT AND REVERSED DC POWERING

被引：6

作者：

BOBBIO, A ^{[1
]}

FERRO, A ^{[1
]}

SARACCO, O ^{[1
]}

机构：

[1] INST ELETTROTECH NAZL GALILEO FERRARIS,10125 TURIN,ITALY

来源：

IEEE TRANSACTIONS ON RELIABILITY | 1974年 / R 23卷 / 03期

关键词：

D O I：

10.1109/TR.1974.5215244

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

收藏

页码：194 / 202

页数：9

相关论文

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[9] BOBBIO A, 1972, 73 REND RIUN ANN AEI
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