DIFFUSION OF BORON FROM IMPLANTED SOURCES UNDER OXIDIZING CONDITIONS

被引：40

作者：

PRINCE, JL ^{[1
]}

SCHWETTMANN, FN ^{[1
]}

机构：

[1] TEXAS INSTR INC, SEMICONDUCTOR RES & DEV LABS, DALLAS, TX 75222 USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1974年 / 121卷 / 05期

关键词：

D O I：

10.1149/1.2401892

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：705 / 710

页数：6

共 19 条

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