共 17 条
[2]
ANISOTROPIC ETCHING OF SILICON
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1978, 25 (10)
:1185-1193
[3]
CUOMO JJ, UNPUB J VAC SCI TECH
[5]
HARPER JME, 1981, J ELECTROCHEM SOC, V128, P1077, DOI 10.1149/1.2127554
[6]
TECHNOLOGY OF ION-BEAM SOURCES USED IN SPUTTERING
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1978, 15 (02)
:272-276
[7]
FOCUSED ION-BEAM DESIGNS FOR SPUTTER DEPOSITION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1979, 16 (03)
:899-905
[8]
STUDY OF AN ION SOURCE OF LOW ENERGY AND HIGH CURRENT DENSITY
[J].
REVUE DE PHYSIQUE APPLIQUEE,
1971, 6 (03)
:325-+