CRYSTALLINE QUALITY OF SILICON LAYER FORMED BY FIPOS TECHNOLOGY

被引:15
作者
IMAI, K
UNNO, H
TAKAOKA, H
机构
关键词
D O I
10.1016/0022-0248(83)90166-5
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
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页码:547 / 553
页数:7
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