TUNGSTEN METAL-FILM FORMED BY SPIN-COATING AMORPHOUS PEROXOPOLYTUNGSTIC ACID

被引：7

作者：

OKAMOTO, H

ISHIKAWA, A

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 18期

关键词：

D O I：

10.1063/1.102332

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1923 / 1925

页数：3

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[1] PLASMA-SURFACE AND GAS-SURFACE INTERACTIONS DURING THE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN FROM H2/WF6
GREEN, WM
HESS, DW
OLDHAM, WG
[J]. JOURNAL OF APPLIED PHYSICS, 1988, 64 (09) : 4696 - 4703
[2] IWATA S, 1973, IEEE T ELECTRON DEV, V31, P1174
[3] THE STRUCTURE OF TETRAGONAL TUNGSTEN TRIOXIDE
KEHL, WL
HAY, RG
WAHL, D
[J]. JOURNAL OF APPLIED PHYSICS, 1952, 23 (02) : 212 - 215
[4] SPIN-COATABLE INORGANIC RESISTS BASED ON NOVEL PEROXOPOLYNIOBOTUNGSTIC ACIDS FOR BILAYER LITHOGRAPHY
KUDO, T
ISHIKAWA, A
OKAMOTO, H
MIYAUCHI, K
MURAI, F
MOCHIJI, K
UMEZAKI, H
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (10) : 2607 - 2613
[5] PEROXOPOLYTUNGSTIC ACIDS SYNTHESIZED BY DIRECT REACTION OF TUNGSTEN OR TUNGSTEN CARBIDE WITH HYDROGEN-PEROXIDE
KUDO, T
OKAMOTO, H
MATSUMOTO, K
SASAKI, Y
[J]. INORGANICA CHIMICA ACTA, 1986, 111 (02) : L27 - L28
[6] LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN AND ALUMINUM FOR VLSI APPLICATIONS
LEVY, RA
GREEN, ML
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (02) : C37 - C49
[7] MILLER NE, 1980, SOLID STATE TECHNOL, V23, P79
[8] PEROXOPOLYTUNGSTIC ACIDS - A NEW INORGANIC RESIST MATERIAL
OKAMOTO, H
IWAYANAGI, T
MOCHIJI, K
UMEZAKI, H
KUDO, T
[J]. APPLIED PHYSICS LETTERS, 1986, 49 (05) : 298 - 300
[9] CONTROL OF RESISTIVITY, MICROSTRUCTURE, AND STRESS IN ELECTRON-BEAM EVAPORATED TUNGSTEN FILMS
SINHA, AK
SMITH, TE
SHENG, TT
AXELROD, NN
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (03): : 436 - 444