High-precision BESOI-based resonant accelerometer

被引:8
作者
Esteve, BJ
机构
[1] Centre Nacional de Microelectrónica (CSIC), Barcelona, 08193, Campus UAB, Bellaterra
关键词
BESOI wafers; resonant accelerometers;
D O I
10.1016/0924-4247(95)01032-V
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A uniaxial resonant acceleration sensor for high-precision measurements, made in bulk micromachining, is presented. The high symmetry of the device structure eliminates rotational acceleration components and diminishes cross-axis sensitivities. Silicon direct bonding, and the use of commercial BESOI (bond and etch back silicon on insulator) wafers, form the sensor structure, which is a silicon-silicon sandwich. The vibrating element is a silicon beam that is driven electrothermally and sensed piezoresistively. Closed-loop operation of the resonator by means of an electronic feedback circuit is demonstrated. Also in closed-loop operation, static and dynamic measurements of prototypes have been performed, showing the very good mechanical properties of the device. The method employed for dynamic testing of a resonant accelerometer on a vibrating table is described.
引用
收藏
页码:7 / 12
页数:6
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