共 10 条
- [1] REACTIVE SPUTTERING OF METALS IN OXIDIZING ATMOSPHERES [J]. THIN SOLID FILMS, 1973, 7 (02) : 163 - 176
- [3] The Mechanism of Reactive Sputtering [J]. JOURNAL OF MATERIALS SCIENCE, 1968, 3 (05) : 544 - 552
- [4] EFFECT OF OXYGEN ON RF-SPUTTERING RATE OF SIO2 [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1968, 5 (03): : 84 - &
- [7] DIELECTRIC PROPERTIES OF REACTIVELY SPUTTERED FILMS OF ALUMINUM NITRIDE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01): : 194 - +
- [8] PREPARATION OF GARNET FILMS BY SPUTTERING [J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (10) : 4700 - &
- [10] VOSSEN JL, 1978, THIN FILM PROCESSES, P3