ETCHING CHARACTERISTICS OF N+ POLY-SI AND AL EMPLOYING A MAGNETRON PLASMA

被引：4

作者：

OKANO, H ^{[1
]}

HORIIKE, Y ^{[1
]}

YAMAZAKI, T ^{[1
]}

TOKURA, T ^{[1
]}

机构：

[1] TOKUDA SEISAKUSHO,ZAMA 228,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1984年 / 23卷 / 04期

关键词：

D O I：

10.1143/JJAP.23.482

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：482 / 486

页数：5

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