SI AND AL ETCHING AND PRODUCT DETECTION IN A PLASMA BEAM UNDER ULTRAHIGH-VACUUM

被引：55

作者：

SMITH, DL

BRUCE, RH

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 09期

关键词：

D O I：

10.1149/1.2124348

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2045 / 2051

页数：7

共 17 条

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