SUBMICRON ELECTRON-BEAM LITHOGRAPHY USING A BEAM SIZE COMPARABLE TO THE LINEWIDTH CONTROL TOLERANCE

被引：15

作者：

ROSENFIELD, MG

BUCCHIGNANO, JJ

RISHTON, SA

KERN, DP

KETTELL, LM

MOLZEN, WW

HOHN, FJ

VISWANATHAN, R

WARLAUMONT, JM

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583843

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：114 / 119

页数：6

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[9] PROXIMITY EFFECT CORRECTION CALCULATIONS BY THE INTEGRAL-EQUATION APPROXIMATE SOLUTION METHOD [J].

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