TRANSPORT OF EXCESS CARRIERS IN SILICON-WAFERS

被引:27
作者
KUNST, M
SANDERS, A
机构
[1] Bereich Solare Energetik, Hahn-Meitner Inst., Berlin
关键词
D O I
10.1088/0268-1242/7/1/009
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Contactless transient photoconductivity measurements are used to study excess charge carrier transport in single-crystal silicon wafers. It is shown that the minority carrier diffusion constant and the minority carrier lifetime can be determined from the decay behaviour by varying the thickness of the wafer. The presence of non-uniform defect densities can be studied by their influence on the diffusion of excess carriers. This is demonstrated by investigation of a proton-irradiated wafer and of a wafer after an internal gettering treatment.
引用
收藏
页码:51 / 59
页数:9
相关论文
共 14 条
[1]  
AHRENKIEL RK, 1988, CURRENT TOPICS PHOTO, V3, P1
[2]  
[Anonymous], 1977, STOPPING RANGES IONS
[3]  
FRANK DR, 1967, ELECTRICAL PROPERTIE
[4]   REVIEW OF SOME CHARGE TRANSPORT PROPERTIES OF SILICON [J].
JACOBONI, C ;
CANALI, C ;
OTTAVIANI, G ;
QUARANTA, AA .
SOLID-STATE ELECTRONICS, 1977, 20 (02) :77-89
[5]   THE STUDY OF CHARGE CARRIER KINETICS IN SEMICONDUCTORS BY MICROWAVE CONDUCTIVITY MEASUREMENTS [J].
KUNST, M ;
BECK, G .
JOURNAL OF APPLIED PHYSICS, 1986, 60 (10) :3558-3566
[6]   THE STUDY OF CHARGE CARRIER KINETICS IN SEMICONDUCTORS BY MICROWAVE CONDUCTIVITY MEASUREMENTS .2. [J].
KUNST, M ;
BECK, G .
JOURNAL OF APPLIED PHYSICS, 1988, 63 (04) :1093-1098
[7]   SURFACE AND VOLUME DECAY PROCESSES IN SEMICONDUCTORS STUDIED BY CONTACTLESS TRANSIENT PHOTOCONDUCTIVITY MEASUREMENTS [J].
KUNST, M ;
MULLER, G ;
SCHMIDT, R ;
WETZEL, H .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 46 (02) :77-85
[8]   ANALYSIS OF THE INTERACTION OF A LASER-PULSE WITH A SILICON-WAFER - DETERMINATION OF BULK LIFETIME AND SURFACE RECOMBINATION VELOCITY [J].
LUKE, KL ;
CHENG, LJ .
JOURNAL OF APPLIED PHYSICS, 1987, 61 (06) :2282-2293
[9]  
MADELUNG O, 1982, LANDOLTBORNSTEIN NEW, V17
[10]  
Many A., 1965, SEMICONDUCTOR SURFAC