ION AND PLASMA ASSISTED ETCHING OF HOLOGRAPHIC GRATINGS

被引：14

作者：

DARBYSHIRE, DA

OVERBURY, AP

PITT, CW

机构：

来源：

VACUUM | 1986年 / 36卷 / 1-3期

关键词：

D O I：

10.1016/0042-207X(86)90270-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：55 / 60

页数：6

共 16 条

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[5]

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[7] GUIDED-WAVE HOLOGRAPHIC GRATING BEAM EXPANDER - FABRICATION AND PERFORMANCE [J].

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PITT, CW ;

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[8]

Neuman V., 1981, First European Conference on Integrated Optics, P89

[9]

PITT CW, 1984, OPTICS COMMUNS, V52, P241

[10]

PITT CW, 1984, APPL OPTICS, V23, P3434

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