X-RAY TOPOGRAPHIC OBSERVATION OF DARK-LINE DEFECTS IN GAAS-GA1-XALXAS DOUBLE-HETEROSTRUCTURE WAFERS

被引:12
作者
KISHINO, S [1 ]
NAKASHIMA, H [1 ]
CHINONE, N [1 ]
ITO, R [1 ]
机构
[1] HITACHI LTD,CENT RES LAB,KOKUBUNJI 185,TOKYO,JAPAN
关键词
D O I
10.1063/1.88655
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:98 / 100
页数:3
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