PALLADIUM SILICIDE FORMATION UNDER THE INFLUENCE OF NITROGEN AND OXYGEN IMPURITIES

[1] THERMAL-STABILITY AND ELECTRICAL-RESISTIVITY OF N-14-IMPLANTED NICKEL CONTACTS ON N+-SI [J]. THIN SOLID FILMS, 1983, 107 (01) : 67 - 71

[2] FOLL H, 1981, J APPL PHYS, V52, P5510, DOI 10.1063/1.329533

[3] HANSEN M, 1958, CONSTITUTION BINARY, P986

[4] HO KH, UNPUB

[5] HO KT, 1983, THIN SOLID FILMS, V104, P243

[6] AN INERT MARKER STUDY FOR PALLADIUM SILICIDE FORMATION - SI MOVES IN POLYCRYSTALLINE PD2SI [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (02) : 227 - 231

[7] HO KT, 1984, MATERIALS RES SOC S, V25, P123

[8] THIN PALLADIUM SILICIDE CONTACTS TO SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (01) : 305 - 310

[9] BEHAVIOR AND INFLUENCE OF OXYGEN IN CHROMIUM SILICIDE FORMATION [J]. THIN SOLID FILMS, 1983, 104 (1-2) : 235 - 242

[10] MURARKA SP, 1983, SILICIDES VLSI APPLI, P73

[1] THERMAL-STABILITY AND ELECTRICAL-RESISTIVITY OF N-14-IMPLANTED NICKEL CONTACTS ON N+-SI [J]. THIN SOLID FILMS, 1983, 107 (01) : 67 - 71

[2] FOLL H, 1981, J APPL PHYS, V52, P5510, DOI 10.1063/1.329533

[3] HANSEN M, 1958, CONSTITUTION BINARY, P986

[4] HO KH, UNPUB

[5] HO KT, 1983, THIN SOLID FILMS, V104, P243

[6] AN INERT MARKER STUDY FOR PALLADIUM SILICIDE FORMATION - SI MOVES IN POLYCRYSTALLINE PD2SI [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (02) : 227 - 231

[7] HO KT, 1984, MATERIALS RES SOC S, V25, P123

[8] THIN PALLADIUM SILICIDE CONTACTS TO SILICON [J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (01) : 305 - 310

[9] BEHAVIOR AND INFLUENCE OF OXYGEN IN CHROMIUM SILICIDE FORMATION [J]. THIN SOLID FILMS, 1983, 104 (1-2) : 235 - 242

[10] MURARKA SP, 1983, SILICIDES VLSI APPLI, P73