NEW TECHNIQUE FOR MEASUREMENT OF IMPLANTED HE PROFILES IN NICKEL

被引：6

作者：

DONNELLY, SE ^{[1
]}

WHITMELL, DS ^{[1
]}

NELSON, RS ^{[1
]}

机构：

[1] AERE,DIV MET,HARWELL DIDCOT,BERKSHIRE,ENGLAND

来源：

RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1977年 / 33卷 / 03期

关键词：

D O I：

10.1080/00337577708233098

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

引用

收藏

页码：145 / 148

页数：4

相关论文

共 11 条

[1] [Anonymous], 1963, KGL DANSKE VIDENSKAB
[2] IMPLANTATION PROFILES OF LOW-ENERGY HELIUM IN NIOBIUM AND BLISTERING MECHANISM
BEHRISCH, R
BOTTIGER, J
ECKSTEIN, W
LITTMARK, U
ROTH, J
SCHERZER, BMU
[J]. APPLIED PHYSICS LETTERS, 1975, 27 (04) : 199 - 201
[3] PROTON BACKSCATTERING AS A TECHNIQUE FOR LIGHT ION SURFACE INTERACTION STUDIES IN CTR MATERIALS INVESTIGATIONS
BLEWER, RS
[J]. JOURNAL OF NUCLEAR MATERIALS, 1974, 53 (01) : 268 - 275
[4] CARTER G, 1976, 8TH P INT SUMM SCH P
[5] DONNELLY SE, 1974, THESIS U SUSSEX
[6] JOHNSON WS, 1969, PROJECTED RANGE STAT
[7] Mathews M., COMMUNICATION
[8] USE OF VIBRATORY POLISHING FOR LOCATION OF ION-BOMBARDMENT INDUCED VOIDS IN METAL FOILS
MAZEY, DJ
FRANCIS, S
WHITTON, JL
HUDSON, JA
[J]. JOURNAL OF MICROSCOPY-OXFORD, 1972, 96 (AUG): : 77 - &
[9] DETERMINATION OF DEPTH DISTRIBUTION OF IMPLANTED HELIUM-ATOMS IN NIOBIUM BY RUTHERFORD BACKSCATTERING
ROTH, J
BEHRISCH, R
SCHERZER, BM
[J]. APPLIED PHYSICS LETTERS, 1974, 25 (11) : 643 - 644
[10] REMOVAL OF THIN (20A) LAYERS OF METALS METAL OXIDES AND CERAMICS BY MECHANICAL POLISHING
WHITTON, JL
[J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (12) : 3917 - &