A DYNAMIC RAM CELL IN RECRYSTALLIZED POLYSILICON

被引:5
作者
JOLLY, RD [1 ]
KAMINS, TI [1 ]
MCCHARLES, RH [1 ]
机构
[1] HEWLETT PACKARD LABS,PALO ALTO,CA 94304
关键词
D O I
10.1109/EDL.1983.25626
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:8 / 11
页数:4
相关论文
共 7 条
[1]   HOLDING TIME DEGRADATION IN DYNAMIC MOS RAM BY INJECTION-INDUCED ELECTRON CURRENTS [J].
EITAN, B ;
FROHMANBENTCHKOWSKY, D ;
SHAPPIR, J .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (12) :1515-1519
[2]   LATERAL EPITAXY BY SEEDED SOLIDIFICATION FOR GROWTH OF SINGLE-CRYSTAL SI FILMS ON INSULATORS [J].
FAN, JCC ;
GEIS, MW ;
TSAUR, BY .
APPLIED PHYSICS LETTERS, 1981, 38 (05) :365-367
[3]   LATERAL EPITAXIAL RECRYSTALLIZATION OF DEPOSITED SILICON FILMS ON SILICON DIOXIDE [J].
KAMINS, TI ;
CASS, TR ;
DELLOCA, CJ ;
LEE, KF ;
PEASE, RFW ;
GIBBONS, JF .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (05) :1151-1154
[4]   MONOLITHIC INTEGRATED-CIRCUIT FABRICATED IN LASER-ANNEALED POLYSILICON [J].
KAMINS, TI ;
LEE, KF ;
GIBBONS, JF ;
SARASWAT, KC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (01) :290-293
[5]  
LAM HW, 1982, IEEE T ELECTRON DEV, V29, P389, DOI 10.1109/T-ED.1982.20713
[6]   ALPHA-PARTICLE-INDUCED SOFT ERRORS IN DYNAMIC MEMORIES [J].
MAY, TC ;
WOODS, MH .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (01) :2-9
[7]   LASER-INDUCED LATERAL EPITAXIAL-GROWTH OF SILICON OVER SILICON DIOXIDE WITH LOCALLY VARIED ENCAPSULATION [J].
SAKURAI, J ;
KAWAMURA, S ;
NAKANO, M ;
TAKAGI, M .
APPLIED PHYSICS LETTERS, 1982, 41 (01) :64-67