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A DYNAMIC RAM CELL IN RECRYSTALLIZED POLYSILICON
被引:5
作者
:
JOLLY, RD
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD LABS,PALO ALTO,CA 94304
HEWLETT PACKARD LABS,PALO ALTO,CA 94304
JOLLY, RD
[
1
]
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD LABS,PALO ALTO,CA 94304
HEWLETT PACKARD LABS,PALO ALTO,CA 94304
KAMINS, TI
[
1
]
MCCHARLES, RH
论文数:
0
引用数:
0
h-index:
0
机构:
HEWLETT PACKARD LABS,PALO ALTO,CA 94304
HEWLETT PACKARD LABS,PALO ALTO,CA 94304
MCCHARLES, RH
[
1
]
机构
:
[1]
HEWLETT PACKARD LABS,PALO ALTO,CA 94304
来源
:
IEEE ELECTRON DEVICE LETTERS
|
1983年
/ 4卷
/ 01期
关键词
:
D O I
:
10.1109/EDL.1983.25626
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:8 / 11
页数:4
相关论文
共 7 条
[1]
HOLDING TIME DEGRADATION IN DYNAMIC MOS RAM BY INJECTION-INDUCED ELECTRON CURRENTS
[J].
EITAN, B
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0
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0
h-index:
0
机构:
HEBREW UNIV JERUSALEM,SCH APPL SCI & TECHNOL,JERUSALEM 91000,ISRAEL
HEBREW UNIV JERUSALEM,SCH APPL SCI & TECHNOL,JERUSALEM 91000,ISRAEL
EITAN, B
;
FROHMANBENTCHKOWSKY, D
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0
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机构:
HEBREW UNIV JERUSALEM,SCH APPL SCI & TECHNOL,JERUSALEM 91000,ISRAEL
HEBREW UNIV JERUSALEM,SCH APPL SCI & TECHNOL,JERUSALEM 91000,ISRAEL
FROHMANBENTCHKOWSKY, D
;
SHAPPIR, J
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0
引用数:
0
h-index:
0
机构:
HEBREW UNIV JERUSALEM,SCH APPL SCI & TECHNOL,JERUSALEM 91000,ISRAEL
HEBREW UNIV JERUSALEM,SCH APPL SCI & TECHNOL,JERUSALEM 91000,ISRAEL
SHAPPIR, J
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1981,
28
(12)
:1515
-1519
[2]
LATERAL EPITAXY BY SEEDED SOLIDIFICATION FOR GROWTH OF SINGLE-CRYSTAL SI FILMS ON INSULATORS
[J].
FAN, JCC
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0
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GEIS, MW
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GEIS, MW
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TSAUR, BY
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TSAUR, BY
.
APPLIED PHYSICS LETTERS,
1981,
38
(05)
:365
-367
[3]
LATERAL EPITAXIAL RECRYSTALLIZATION OF DEPOSITED SILICON FILMS ON SILICON DIOXIDE
[J].
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
KAMINS, TI
;
CASS, TR
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机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
CASS, TR
;
DELLOCA, CJ
论文数:
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引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
DELLOCA, CJ
;
LEE, KF
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
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;
PEASE, RFW
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STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
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;
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机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
GIBBONS, JF
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1981,
128
(05)
:1151
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[4]
MONOLITHIC INTEGRATED-CIRCUIT FABRICATED IN LASER-ANNEALED POLYSILICON
[J].
KAMINS, TI
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0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
KAMINS, TI
;
LEE, KF
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0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
LEE, KF
;
GIBBONS, JF
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STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
GIBBONS, JF
;
SARASWAT, KC
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STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
SARASWAT, KC
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(01)
:290
-293
[5]
LAM HW, 1982, IEEE T ELECTRON DEV, V29, P389, DOI 10.1109/T-ED.1982.20713
[6]
ALPHA-PARTICLE-INDUCED SOFT ERRORS IN DYNAMIC MEMORIES
[J].
MAY, TC
论文数:
0
引用数:
0
h-index:
0
机构:
Intel Corporation, Santa Clara
MAY, TC
;
WOODS, MH
论文数:
0
引用数:
0
h-index:
0
机构:
Intel Corporation, Santa Clara
WOODS, MH
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1979,
26
(01)
:2
-9
[7]
LASER-INDUCED LATERAL EPITAXIAL-GROWTH OF SILICON OVER SILICON DIOXIDE WITH LOCALLY VARIED ENCAPSULATION
[J].
SAKURAI, J
论文数:
0
引用数:
0
h-index:
0
SAKURAI, J
;
KAWAMURA, S
论文数:
0
引用数:
0
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0
KAWAMURA, S
;
NAKANO, M
论文数:
0
引用数:
0
h-index:
0
NAKANO, M
;
TAKAGI, M
论文数:
0
引用数:
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h-index:
0
TAKAGI, M
.
APPLIED PHYSICS LETTERS,
1982,
41
(01)
:64
-67
←
1
→
共 7 条
[1]
HOLDING TIME DEGRADATION IN DYNAMIC MOS RAM BY INJECTION-INDUCED ELECTRON CURRENTS
[J].
EITAN, B
论文数:
0
引用数:
0
h-index:
0
机构:
HEBREW UNIV JERUSALEM,SCH APPL SCI & TECHNOL,JERUSALEM 91000,ISRAEL
HEBREW UNIV JERUSALEM,SCH APPL SCI & TECHNOL,JERUSALEM 91000,ISRAEL
EITAN, B
;
FROHMANBENTCHKOWSKY, D
论文数:
0
引用数:
0
h-index:
0
机构:
HEBREW UNIV JERUSALEM,SCH APPL SCI & TECHNOL,JERUSALEM 91000,ISRAEL
HEBREW UNIV JERUSALEM,SCH APPL SCI & TECHNOL,JERUSALEM 91000,ISRAEL
FROHMANBENTCHKOWSKY, D
;
SHAPPIR, J
论文数:
0
引用数:
0
h-index:
0
机构:
HEBREW UNIV JERUSALEM,SCH APPL SCI & TECHNOL,JERUSALEM 91000,ISRAEL
HEBREW UNIV JERUSALEM,SCH APPL SCI & TECHNOL,JERUSALEM 91000,ISRAEL
SHAPPIR, J
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1981,
28
(12)
:1515
-1519
[2]
LATERAL EPITAXY BY SEEDED SOLIDIFICATION FOR GROWTH OF SINGLE-CRYSTAL SI FILMS ON INSULATORS
[J].
FAN, JCC
论文数:
0
引用数:
0
h-index:
0
FAN, JCC
;
GEIS, MW
论文数:
0
引用数:
0
h-index:
0
GEIS, MW
;
TSAUR, BY
论文数:
0
引用数:
0
h-index:
0
TSAUR, BY
.
APPLIED PHYSICS LETTERS,
1981,
38
(05)
:365
-367
[3]
LATERAL EPITAXIAL RECRYSTALLIZATION OF DEPOSITED SILICON FILMS ON SILICON DIOXIDE
[J].
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
KAMINS, TI
;
CASS, TR
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
CASS, TR
;
DELLOCA, CJ
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
DELLOCA, CJ
;
LEE, KF
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
LEE, KF
;
PEASE, RFW
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
PEASE, RFW
;
GIBBONS, JF
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
GIBBONS, JF
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1981,
128
(05)
:1151
-1154
[4]
MONOLITHIC INTEGRATED-CIRCUIT FABRICATED IN LASER-ANNEALED POLYSILICON
[J].
KAMINS, TI
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
KAMINS, TI
;
LEE, KF
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
LEE, KF
;
GIBBONS, JF
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
GIBBONS, JF
;
SARASWAT, KC
论文数:
0
引用数:
0
h-index:
0
机构:
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305
SARASWAT, KC
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1980,
27
(01)
:290
-293
[5]
LAM HW, 1982, IEEE T ELECTRON DEV, V29, P389, DOI 10.1109/T-ED.1982.20713
[6]
ALPHA-PARTICLE-INDUCED SOFT ERRORS IN DYNAMIC MEMORIES
[J].
MAY, TC
论文数:
0
引用数:
0
h-index:
0
机构:
Intel Corporation, Santa Clara
MAY, TC
;
WOODS, MH
论文数:
0
引用数:
0
h-index:
0
机构:
Intel Corporation, Santa Clara
WOODS, MH
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1979,
26
(01)
:2
-9
[7]
LASER-INDUCED LATERAL EPITAXIAL-GROWTH OF SILICON OVER SILICON DIOXIDE WITH LOCALLY VARIED ENCAPSULATION
[J].
SAKURAI, J
论文数:
0
引用数:
0
h-index:
0
SAKURAI, J
;
KAWAMURA, S
论文数:
0
引用数:
0
h-index:
0
KAWAMURA, S
;
NAKANO, M
论文数:
0
引用数:
0
h-index:
0
NAKANO, M
;
TAKAGI, M
论文数:
0
引用数:
0
h-index:
0
TAKAGI, M
.
APPLIED PHYSICS LETTERS,
1982,
41
(01)
:64
-67
←
1
→