GROWTH OF NI2SI BY RAPID THERMAL ANNEALING - KINETICS AND MOVING SPECIES

被引：10

作者：

MA, E ^{[1
]}

LIM, BS ^{[1
]}

NICOLET, MA ^{[1
]}

NATAN, M ^{[1
]}

机构：

[1] MARTIN MARIETTA CORP LABS,BALTIMORE,MD 21227

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1987年 / 44卷 / 02期

关键词：

D O I：

10.1007/BF00626417

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：157 / 160

页数：4

共 19 条

[1] DHEURLE FM, 1986, MATER RES SOC S P, V52, P261
[2] HOPKINS CG, 1984, MATER RES SOC S P, V25, P87
[3] KATZ A, 1986, IN PRESS FALL MRS M
[4] FORMATION OF PALLADIUM AND TITANIUM SILICIDES BY RAPID THERMAL ANNEALING
LEVY, D
PONPON, JP
GROB, A
GROB, JJ
SIFFERT, P
[J]. PHYSICA B & C, 1985, 129 (1-3): : 205 - 209
[5] FORMATION OF PALLADIUM SILICIDE BY RAPID THERMAL ANNEALING
LEVY, D
GROB, A
GROB, JJ
PONPON, JP
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1984, 35 (03): : 141 - 144
[6] KINETICS OF SILICIDES ON SI(100) AND EVAPORATED SILICON SUBSTRATES
LIEN, CD
NICOLET, MA
LAU, SS
[J]. THIN SOLID FILMS, 1986, 143 (01) : 63 - 72
[7] GROWTH OF CO-SILICIDES FROM SINGLE-CRYSTAL AND EVAPORATED SI
LIEN, CD
NICOLET, MA
PAI, CS
LAU, SS
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 36 (03): : 153 - 157
[8] LIM BS, IN PRESS J APPL PHYS
[9] Murarka S. P., 1983, SILICIDES VLSI APPLI
[10] ANOMALOUS 1ST-PHASE FORMATION IN RAPIDLY THERMAL ANNEALED, THIN-LAYERED SI NI SI FILMS
NATAN, M
[J]. APPLIED PHYSICS LETTERS, 1986, 49 (05) : 257 - 259