STUDIES OF PUSH-OUT EFFECT IN SILICON .1. COMPARISON OF SEQUENTIAL BORON-PHOSPHORUS AND GALLIUM-PHOSPHORUS DIFFUSIONS

被引：9

作者：

JONES, CL ^{[1
]}

WILLOUGHBY, AFW ^{[1
]}

机构：

[1] UNIV SOUTHAMPTON,ENGN MAT LABS,SOUTHAMPTON S09 5NH,ENGLAND

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1975年 / 122卷 / 11期

关键词：

D O I：

10.1149/1.2134057

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1531 / 1538

页数：8

共 23 条

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