RF REACTIVELY SPUTTERED TIN - CHARACTERIZATION AND ADHESION TO MATERIALS OF TECHNICAL INTEREST

被引：22

作者：

BUCHER, JP ^{[1
]}

ACKERMANN, KP ^{[1
]}

BUSCHOR, FW ^{[1
]}

机构：

[1] BROWN BOVERI & CIE AG,ANGEW PHYS & MESSTECH LAB,CH-5401 BADEN,SWITZERLAND

来源：

THIN SOLID FILMS | 1984年 / 122卷 / 01期

关键词：

RF SPUTTERING - TITANIUM NITRIDE;

D O I：

10.1016/0040-6090(84)90379-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：63 / 71

页数：9

共 24 条

[1] DEPOSITION RATE OF METALLIC THIN-FILMS IN REACTIVE SPUTTERING PROCESS [J].

ABE, T ;

YAMASHINA, T .

THIN SOLID FILMS, 1975, 30 (01) :19-27

[2] EFFECT OF ION-IMPLANTATION ON THIN HARD COATINGS [J].

AUNER, G ;

HSIEH, YF ;

PADMANABHAN, KR ;

CHEVALLIER, J ;

SORENSEN, G .

THIN SOLID FILMS, 1983, 107 (02) :191-199

[3] TIN COATINGS ON STEEL [J].

BUHL, R ;

PULKER, HK ;

MOLL, E .

THIN SOLID FILMS, 1981, 80 (1-3) :265-270

[4]

CASTELLANO RN, 1977, 7TH P INT VAC C 3RD, V2, P1449

[5] REACTIVELY SPUTTERED TITANIUM CARBIDE THIN-FILMS - PREPARATION AND PROPERTIES [J].

EIZENBERG, M ;

MURARKA, SP .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (06) :3190-3194

[6] RF-SPUTTERED SILICON AND HAFNIUM NITRIDES - PROPERTIES AND ADHESION TO 440C STAINLESS-STEEL [J].

GRILL, A ;

ARON, PR .

THIN SOLID FILMS, 1983, 108 (02) :173-180

[7]

HINTERMANN HE, 1983, HAFTUNG ALS BASIS ST, P87

[8] ADHESION AND HARDNESS OF ION-PLATED TIC AND TIN COATINGS [J].

HUMMER, E ;

PERRY, AJ .

THIN SOLID FILMS, 1983, 101 (03) :243-251

[9] THIN TIN COATINGS DEPOSITED ONTO NODULAR CAST-IRON BY ION-ASSISTED AND PLASMA-ASSISTED COATING TECHNIQUES [J].

KLOOS, KH ;

BROSZEIT, E ;

GABRIEL, HM ;

SCHRODER, HJ .

THIN SOLID FILMS, 1982, 96 (01) :67-77

[10]

KNOTEK O, 1983, METALL BERLIN, V3, P233

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