PHOTODEPOSITION OF ALUMINUM-OXIDE AND ALUMINUM THIN-FILMS

被引：88

作者：

SOLANKI, R ^{[1
]}

RITCHIE, WH ^{[1
]}

COLLINS, GJ ^{[1
]}

机构：

[1] COLORADO STATE UNIV,ENGN RES CTR,FT COLLINS,CO 80523

来源：

APPLIED PHYSICS LETTERS | 1983年 / 43卷 / 05期

关键词：

D O I：

10.1063/1.94386

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：454 / 456

页数：3

共 22 条

[1] ABBOTT RA, 1971, SOLID STATE ELECT, V13, P565
[2] DEPOSITION AND PROPERTIES OF ALUMINUM OXIDE OBTAINED BY PYROLYTIC DECOMPOSITION OF AN ALUMINUM ALKOXIDE
ABOAF, JA
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1967, 114 (09) : 948 - &
[3] FILMS OF SILICON NITRIDE-SILICON DIOXIDE MIXTURES
CHU, TL
SZEDON, JR
LEE, CH
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (03) : 318 - &
[4] ELECTRICAL PROPERTIES OF VAPOR-DEPOSITED SILICON NITRIDE AND SILICON OXIDE FILMS ON SILICON
DEAL, BE
FLEMING, PJ
CASTRO, PL
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (03) : 300 - &
[5] LASER PHOTODEPOSITION OF METAL-FILMS WITH MICROSCOPIC FEATURES
DEUTSCH, TF
EHRLICH, DJ
OSGOOD, RM
[J]. APPLIED PHYSICS LETTERS, 1979, 35 (02) : 175 - 177
[6] CHARGE STORAGE AND STOICHIOMETRY IN ELECTRON-BEAM EVAPORATED ALUMINA
EISELE, KM
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (01) : 148 - 152
[7] PRELIMINARY INVESTIGATIONS OF REACTIVELY EVAPORATED ALUMINUM OXIDE FILMS ON SILICON
FERRIEU, E
PRUNIAUX, B
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (07) : 1008 - +
[8] PHASE CHANGES IN THIN REACTIVELY SPUTTERED ALUMINA FILMS
FRIESER, RG
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (04) : 357 - &
[9] PROPERTIES OF ALUMINUM OXIDE FILMS OBTAINED FROM NITROUS OXIDE AND ALUMINUM TRIMETHYL
HALL, LH
ROBINETTE, WC
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (10) : 1624 - +
[10] PREPARATION AND PROPERTIES OF ALUMINUM OXIDE FILMS OBTAINED BY GLOW DISCHARGE TECHNIQUE
KATTO, H
KOGA, Y
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1971, 118 (10) : 1619 - &

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