TEMPERATURE-DEPENDENT REACTION AND ATOMIC REDISTRIBUTION FOR TI/GAAS(100) INTERFACES

被引：7

作者：

XU, F

HILL, DM

LIN, ZD

ANDERSON, SG

SHAPIRA, Y

WEAVER, JH

机构：

来源：

PHYSICAL REVIEW B | 1988年 / 37卷 / 17期

关键词：

D O I：

10.1103/PhysRevB.37.10295

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：10295 / 10300

页数：6

共 20 条

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