DIRECT-CURRENT-MAGNETRON DEPOSITION OF MOLYBDENUM AND TUNGSTEN WITH RF-SUBSTRATE BIAS

被引：38

作者：

BENSAOULA, A ^{[1
]}

WOLFE, JC ^{[1
]}

IGNATIEV, A ^{[1
]}

FONG, FO ^{[1
]}

LEUNG, TS ^{[1
]}

机构：

[1] UNIV HOUSTON,DEPT ELECT ENGN,HOUSTON,TX 77004

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1984年 / 2卷 / 02期

关键词：

D O I：

10.1116/1.572749

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：389 / 392

页数：4

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