FOCUSING CHARACTERISTICS OF X-RAY ZONE PLATES FABRICATED BY ELECTRON-BEAM LITHOGRAPHY AND REACTIVE ION ETCHING

被引：5

作者：

ARITOME, H

AOKI, H

NAMBA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1984年 / 23卷 / 06期

关键词：

D O I：

10.1143/JJAP.23.L406

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L406 / L408

页数：3

共 7 条

[1] COMPUTER-DRAWN MODULATED ZONE PLATES
ENGEL, A
HERZIGER, G
[J]. APPLIED OPTICS, 1973, 12 (03): : 471 - 479
[2] FUJITA T, 1981, T I ELECTRON COMMUN, V64, P654
[3] PRACTICAL ASPECTS OF MICROFABRICATION IN THE 100 NM REGIME
KERN, DP
HOUZEGO, PJ
COANE, PJ
CHANG, THP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1096 - 1100
[4] FABRICATION OF HIGH NUMERICAL APERTURE ZONE PLATES USING DEEP ULTRAVIOLET LITHOGRAPHY
KODATE, K
TAKENAKA, H
KAMIYA, T
[J]. APPLIED OPTICS, 1984, 23 (03): : 504 - 507
[5] THE GOTTINGEN X-RAY MICROSCOPES
NIEMANN, B
RUDOLPH, D
SCHMAHL, G
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 208 (1-3): : 367 - 371
[6] X-RAY ZONE PLATES FABRICATED USING ELECTRON-BEAM AND X-RAY-LITHOGRAPHY
SHAVER, DC
FLANDERS, DC
CEGLIO, NM
SMITH, HI
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1626 - 1630
[7] YANAGIHARA M, UNPUB KEK REPORT