THE CHEMICAL VAPOR-DEPOSITION OF SIO2 FROM TEOS

被引：25

作者：

CROWELL, JE ^{[1
]}

TEDDER, LL ^{[1
]}

CHO, HC ^{[1
]}

CASCARANO, FM ^{[1
]}

LOGAN, MA ^{[1
]}

机构：

[1] LAM RES CORP,ADV RES CTR,SAN DIEGO,CA 92126

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1990年 / 54卷

关键词：

D O I：

10.1016/0368-2048(90)80299-P

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

The dissociative adsorption and thermal decomposition of tetraethoxysilane, TEOS, has been studied on Si(100) and SiO2. TEOS reacts with either surface at elevated temperatures to produce a mixture of di- and triethoxysiloxanes. These intermediates decompose in vacuum to evolve ethylene and deposit SiO2. Strong similarities are evident in the decomposition of TEOS on both surfaces.

引用

页码：1097 / 1104

页数：8

共 20 条

[1] DEPOSITION OF SILICON DIOXIDE FILMS AT REDUCED PRESSURE
ADAMS, AC
CAPIO, CD
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (06) : 1042 - 1046
[2] LOW-PRESSURE DEPOSITION OF DOPED SIO2 BY PYROLYSIS OF TETRAETHYLORTHOSILICATE (TEOS) .1. BORON AND PHOSPHORUS DOPED FILMS
BECKER, FS
ROHL, S
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (11) : 2923 - 2931
[3] PROCESS AND FILM CHARACTERIZATION OF LOW-PRESSURE TETRAETHYLORTHOSILICATE-BOROPHOSPHOSILICATE GLASS
BECKER, FS
PAWLIK, D
SCHAFER, H
STAUDIGL, G
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (03): : 732 - 744
[4] LOW-PRESSURE DEPOSITION OF HIGH-QUALITY SIO2-FILMS BY PYROLYSIS OF TETRAETHYLORTHOSILICATE
BECKER, FS
PAWLIK, D
ANZINGER, H
SPITZER, A
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (06): : 1555 - 1563
[5] CASCARANO FM, UNPUB
[6] MODEL STUDIES OF DIELECTRIC THIN-FILM GROWTH - CHEMICAL VAPOR-DEPOSITION OF SIO2
CROWELL, JE
TEDDER, LL
CHO, HC
CASCARANO, FM
LOGAN, MA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 1864 - 1870
[7] CROWELL JE, 1990, 1990 SEM SIL P EL SO, V90, P215
[8] JIN T, 1989, CHEM MATERIALS, V14, P308
[9] DESORPTION-KINETICS OF HYDROGEN AND DEUTERIUM FROM SI(111) 7X7 STUDIED USING LASER-INDUCED THERMAL-DESORPTION
KOEHLER, BG
MAK, CH
ARTHUR, DA
COON, PA
GEORGE, SM
[J]. JOURNAL OF CHEMICAL PHYSICS, 1988, 89 (03) : 1709 - 1718
[10] LOW-PRESSURE DEPOSITION OF PHOSPHOSILICATE GLASS-FILMS
LEVIN, RM
ADAMS, AC
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (07) : 1588 - 1592

← 1 2 →