AN INSITU TRANSMISSION ELECTRON-MICROSCOPY STUDY OF ELECTRON-BEAM-INDUCED AMORPHOUS-TO-CRYSTALLINE TRANSFORMATION OF AL2O3 FILMS ON SILICON

被引：13

作者：

LIU, J

BARBERO, CJ

CORBETT, JW

RAJAN, K

LEARY, H

机构：

[1] RENSSELAER POLYTECH INST, DEPT MAT ENGN, TROY, NY 12180 USA

[2] IBM CORP, FISHKILL, NY 12533 USA

来源：

JOURNAL OF APPLIED PHYSICS | 1993年 / 73卷 / 10期

关键词：

D O I：

10.1063/1.353757

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

An in situ transmission electron microscopy study of the amorphous-to-crystalline transformation of Al2O3 films on a silicon substrate has been carried out. It is found that a critical electron-beam dose rate is required for the transformation to be observed. The possible effect of the silicon substrate on the growth of the Al2O3 crystallites is also discussed.

引用

页码：5272 / 5273

页数：2

共 13 条

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