COHERENT ANTI-STOKES RAMAN-SPECTROSCOPIC STUDY OF CO2-LASER CVD OF SILANE

被引：10

作者：

HANABUSA, M

KIKUCHI, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1983年 / 22卷 / 11期

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D O I：

10.1143/JJAP.22.L712

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：L712 / L714

页数：3

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[1] ENERGY-DISTRIBUTION AMONG REACTION PRODUCTS .5. H+X2(X=CL, BR), D+CL2
ANLAUF, KG
POLANYI, JC
WOODALL, KB
MACDONAL.RG
HORNE, DS
[J]. JOURNAL OF CHEMICAL PHYSICS, 1972, 57 (04) : 1561 - &
[2] LASER-INDUCED CHEMICAL VAPOR-DEPOSITION OF POLYCRYSTALLINE SI FROM SICL4
BARANAUSKAS, V
MAMMANA, CIZ
KLINGER, RE
GREENE, JE
[J]. APPLIED PHYSICS LETTERS, 1980, 36 (11) : 930 - 932
[3] HYDROGENATED AMORPHOUS-SILICON GROWTH BY CO2-LASER PHOTO-DISSOCIATION OF SILANE
BILENCHI, R
GIANINONI, I
MUSCI, M
[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (09) : 6479 - 6481
[4] BILENCHI R, 1981, 8TH P INT C CHEM VAP, P275
[5] CHEMICAL VAPOR-DEPOSITION OF SILICON USING A CO2-LASER
CHRISTENSEN, CP
LAKIN, KM
[J]. APPLIED PHYSICS LETTERS, 1978, 32 (04) : 254 - 256
[6] GATTUSO TR, 1983, 1982 P MAT RES SOC L, V17, P215
[7] LASER-INDUCED DEPOSITION OF SILICON FILMS
HANABUSA, M
MORIYAMA, S
KIKUCHI, H
[J]. THIN SOLID FILMS, 1983, 107 (03) : 227 - 234
[8] DETECTION OF NEUTRAL SPECIES IN SILANE PLASMA USING COHERENT ANTI-STOKES RAMAN-SPECTROSCOPY
HATA, N
MATSUDA, A
TANAKA, K
KAJIYAMA, K
MORO, N
SAJIKI, K
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1983, 22 (01): : L1 - L3
[9] HYDROGEN ELIMINATION DURING THE GLOW-DISCHARGE DEPOSITION OF A-SI-H ALLOYS
KAMPAS, FJ
GRIFFITH, RW
[J]. APPLIED PHYSICS LETTERS, 1981, 39 (05) : 407 - 409
[10] KLICH D, 1981, APPL OPTICS, V7, P1178