RARE-EARTH OVERLAYERS ON SILICON

被引:94
作者
NETZER, FP
机构
[1] Inst. Fur Experimentalphys., Karl-Franzens-Univ., Graz
关键词
D O I
10.1088/0953-8984/7/6/006
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The physiochemical properties of thin layers of rare earth metals and rare earth silicides on Si substrate surfaces are reviewed. The topics discussed include the formation of reactive interfaces at room temperature, the evolution of ordered surface structures at elevated temperature and the oxidation of rare earth interfaces and silicides. Special emphasis is placed on the discussion of the geometrical and electronic structure of ordered overlayer phases.
引用
收藏
页码:991 / 1022
页数:32
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