POLYMER RESIST SYSTEMS FOR PHOTOLITHOGRAPHY AND ELECTRON LITHOGRAPHY

被引：80

作者：

THOMPSON, LF ^{[1
]}

KERWIN, RE ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

ANNUAL REVIEW OF MATERIALS SCIENCE | 1976年 / 6卷

关键词：

D O I：

10.1146/annurev.ms.06.080176.001411

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：267 / 301

页数：35

相关论文

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