EFFECT OF OXYGEN INCORPORATION ON PROPERTIES OF RF-SPUTTERED A-SI-H FILMS

被引：4

作者：

JIRANAPAKUL, K

SHIRAFUJI, J

机构：

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1986年 / 81卷 / 1-2期

关键词：

D O I：

10.1016/0022-3093(86)90256-5

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：29 / 40

页数：12

共 29 条

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