SCHOTTKY-BARRIER AND SURFACE PHOTOVOLTAGE INDUCED BY SYNCHROTRON-RADIATION IN GAP(110)/AG

被引:14
作者
CHIARADIA, P [2 ]
BONNET, JE
FANFONI, M
GOLETTI, C
LAMPEL, G
机构
[1] UNIV PARIS 11,UTILISAT RAYONNEMENT ELECTROMAGNET LAB,F-91405 ORSAY,FRANCE
[2] UNIV ROMA TOR VERGATA,DIPARTIMENTO FIS,ROME,ITALY
[3] ECOLE POLYTECH,PHYS MAT CONDENSEE LAB,F-91128 PALAISEAU,FRANCE
来源
PHYSICAL REVIEW B | 1993年 / 47卷 / 20期
关键词
D O I
10.1103/PhysRevB.47.13520
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We measure the Schottky-barrier formation and the surface photovoltage induced by synchrotron radiation by complementing photoemission measurements with a Kelvin probe. This combined technique is applied to the Ag/GaP(110) interface, grown at room temperature. Large photovoltage shifts are observed up to high coverage. Based on decomposition of the Ga 3d core-level line shapes and surface photovoltage corrections, we conclude that the evolution of the Fermi level takes place during the deposition of about 15 angstrom, yielding a final Schottky barrier of 1.15 eV.
引用
收藏
页码:13520 / 13526
页数:7
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