THE EFFECT OF SURFACE-TOPOGRAPHY EVOLUTION ON SPUTTER PROFILING DEPTH RESOLUTION IN SI

被引:11
作者
CARTER, G [1 ]
NOBES, MJ [1 ]
LEWIS, GW [1 ]
BROWN, CR [1 ]
机构
[1] UNIV SALFORD,THIN FILMS & SURFACE RES CTR,SALFORD M5 4WT,LANCS,ENGLAND
关键词
SILICON AND ALLOYS - Radiation Damage;
D O I
10.1002/sia.740070108
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Experimental studies of the development of surface topography on Si surfaces during Ar** plus ion bombardment and sputter erosion indicates that the Si becomes continuously prismatically facetted and that facet dimensions increase linearly with mean eroded depth. These observations lead to an analytic model of the achievable depth resolution delta z/z//0 in sputter erosion which is independent, for deep profiles of z//0.
引用
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页码:35 / 40
页数:6
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