OPTICAL-PROPERTIES OF TITANIUM NITRIDE THIN-FILMS

被引：10

作者：

TOMPKINS, HG ^{[1
]}

GREGORY, R ^{[1
]}

BOECK, B ^{[1
]}

机构：

[1] MOTOROLA INC, AUSTIN, TX 78721 USA

来源：

SURFACE AND INTERFACE ANALYSIS | 1991年 / 17卷 / 01期

关键词：

D O I：

10.1002/sia.740170107

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Titanium nitride films were deposited using various process parameters. The film stoichiometry and the optical properties were then measured for all of the films. As expected, the stoichiometry is affected by the deposition rate and composition of the gas phase. We show that the index of refraction is affected by the substrate temperature as well as by the stoichiometry. We also show that as long as the amount of nitrogen in the film is above a critical value, the film is nitride-like. When the amount of nitrogen in the film drops below a critical value, the index of refraction is more characteristic of metallic titanium than titanium nitride.

引用

页码：22 / 24

页数：3

共 15 条

[1] ANALYTICAL ELECTRON-MICROSCOPY OF AL/TIN CONTACTS ON SILICON FOR APPLICATIONS TO VERY LARGE-SCALE INTEGRATED DEVICES [J].