ELECTRONIC CONDUCTION AND INSTABILITIES IN THIN-FILMS OF AMORPHOUS-SILICON DIOXIDE

被引：9

作者：

DELIMA, JJ

KRISHNA, KV

OWEN, AE

机构：

来源：

PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES | 1986年 / 53卷 / 02期

关键词：

D O I：

10.1080/13642818608238979

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：115 / 131

页数：17

共 13 条

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[8] HIGH-FIELD VARIABLE RANGE HOPPING OF HOLE-LIKE POLARONS IN RF SPUTTERED SIO2-FILMS [J].

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[9] ELECTRICAL TRANSPORT IN RF-SPUTTERED SIO2-FILMS - A REVIEW [J].

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