ION-BEAM LITHOGRAPHY - AN INVESTIGATION OF RESOLUTION LIMITS AND SENSITIVITIES OF ION-BEAM EXPOSED PMMA

被引：16

作者：

KARAPIPERIS, L

DUBREUIL, D

DAVID, P

DIEUMEGARD, D

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期

关键词：

D O I：

10.1116/1.583262

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：353 / 357

页数：5

共 17 条

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