SWIRL FORMATION OF DEFECTS IN CZOCHRALSKI-GROWN SILICON CRYSTAL

被引：8

作者：

YASUAMI, S

OGINO, M

TAKASU, S

机构：

[1] TOSHIBA LTD,CTR RES & DEV,KAWASAKI 210,JAPAN

[2] TOSHIBA LTD,TRANSISTOR WORKS,KAWASAKI 210,JAPAN

来源：

JOURNAL OF CRYSTAL GROWTH | 1977年 / 39卷 / 02期

关键词：

D O I：

10.1016/0022-0248(77)90268-8

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：227 / 230

页数：4

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