PROPERTIES OF AMORPHOUS FILMS PREPARED FROM SIH4-N2-H2 GAS-MIXTURE

被引：39

作者：

WATANABE, H ^{[1
]}

KATOH, K ^{[1
]}

YASUI, M ^{[1
]}

机构：

[1] STANLEY ELECT CO LTD,RES & DEV LAB,MIDORI KU,YOKOHAMA 227,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1982年 / 21卷 / 06期

关键词：

D O I：

10.1143/JJAP.21.L341

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L341 / L343

页数：3

共 10 条

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