DOPING OF GALLIUM-ARSENIDE IN A LOW-PRESSURE ORGANOMETALLIC CVD SYSTEM .1. SILANE

被引：35

作者：

FIELD, RJ

GHANDHI, SK

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1986年 / 74卷 / 03期

关键词：

D O I：

10.1016/0022-0248(86)90200-9

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

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页码：543 / 550

页数：8

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