VERY HIGH-CURRENT ECR ION-SOURCE FOR AN OXYGEN ION IMPLANTER

被引：27

作者：

TORII, Y

SHIMADA, M

WATANABE, I

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1987年 / 21卷 / 2-4期

关键词：

D O I：

10.1016/0168-583X(87)90820-2

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

收藏

页码：178 / 181

页数：4

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