0.33-MU-M GATE-LENGTH MILLIMETER-WAVE INP-CHANNEL HEMTS WITH HIGH FT AND FMAX

被引:17
作者
AINA, L
BURGESS, M
MATTINGLY, M
OCONNOR, JM
MEERSCHAERT, A
TONG, M
KETTERSON, A
ADESIDA, I
机构
[1] UNIV ILLINOIS,CTR COMPOUND SEMICOND MICROELECTR,URBANA,IL 61801
[2] UNIV ILLINOIS,DEPT ELECT & COMP ENGN,URBANA,IL 61801
基金
美国国家科学基金会;
关键词
D O I
10.1109/55.116925
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report the fabrication of the first 0.33-mu-m gate-length AlInAs/InP high electron mobility transistors (HEMT's). These InP-channel devices have f(t) values as high as 76 GHz, f(max) values of 146 GHz, and maximum stable gains of 16.8, 14, and 12 dB at 10, 18, and 30 GHz, respectively. The extrinsic dc transconductances are as high as 610 mS/mm, with drain-source breakdown voltages exceeding 10 V. The effective electron velocity in the InP channel is estimated to be at least 1.8 X 10(7) cm/s, while the f(t)L(g) product is 29 GHz . mu-m. These results are the best that we are aware of for InP-channel devices and are comparable to the best reported results for similar InGaAs-channel devices.
引用
收藏
页码:483 / 485
页数:3
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