PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION OF POLYCRYSTALLINE DIAMOND AND DIAMONDLIKE FILMS

被引：11

作者：

VITKAVAGE, DJ

RUDDER, RA

FOUNTAIN, GG

MARKUNAS, RJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1988年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.575258

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1812 / 1815

页数：4

共 11 条

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[6] THERMAL-CONDUCTIVITY OF DIAMOND FILMS SYNTHESIZED BY MICROWAVE PLASMA CVD [J].

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NISHIKAWA, A .

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[7] REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR DEPOSITION OF EPITAXIAL GE FILMS [J].

RUDDER, RA ;

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JOURNAL OF APPLIED PHYSICS, 1986, 60 (10) :3519-3522

[8]

RUDDER RA, 1987, 2ND ANN DIAM TECHN I

[9] VAPOR GROWTH OF DIAMOND ON DIAMOND AND OTHER SURFACES [J].

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[10]

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