THE CHARACTERIZATION OF TITANIUM NITRIDE BY X-RAY PHOTOELECTRON-SPECTROSCOPY AND RUTHERFORD BACKSCATTERING

被引:119
作者
VASILE, MJ
EMERSON, AB
BAIOCCHI, FA
机构
[1] AT&T Bell Laboratories, New Jersey 07974, Murray Hill
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1990年 / 8卷 / 01期
关键词
D O I
10.1116/1.576995
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
X-ray photoelectron spectroscopy (XPS) spectra have been obtained for TiNx, with x = 0.25, 0.50, and 1.0, as determined by Rutherford backscattering (RBS) analyses, and with no detectable oxygen content. We find the shape of the Ti 2p transition to be strongly dependent upon the nitrogen content, and interpret the spectrum as a mixture of Ti and TiN. TiNL0samples with varying oxygen content were also examined, and the oxygen content serves to increase the background step in the Ti 2p transition. Angle resolved measurements indicate that the inelastic scattering due to oxygen is superimposed over an intrinsic satellite structure in the Ti 2p transition. Atom ratios, N/Ti, cannot be accurately determined by XPS without standardization. The binding energy of the Ti 2p3/2transition occurs at 454.5 eV and the N Is transition occurs at 396.7 eV. The oxygen that is present in TiN at concentrations up to 12 at. % is most likely bound to Ti as TiO rather than Ti02. Valence band measurements agree well with previous reports. © 1990, American Vacuum Society. All rights reserved.
引用
收藏
页码:99 / 105
页数:7
相关论文
共 19 条
[1]  
BRIGGS D, 1983, PRACTICAL SURFACE AN, P130
[2]   A CORRELATION OF AUGER-ELECTRON SPECTROSCOPY, X-RAY PHOTOELECTRON-SPECTROSCOPY, AND RUTHERFORD BACKSCATTERING SPECTROMETRY MEASUREMENTS ON SPUTTER-DEPOSITED TITANIUM NITRIDE THIN-FILMS [J].
BURROW, BJ ;
MORGAN, AE ;
ELLWANGER, RC .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (06) :2463-2469
[3]   QUANTITATIVE AUGER-ELECTRON ANALYSIS OF TITANIUM NITRIDES [J].
DAWSON, PT ;
TZATZOV, KK .
SURFACE SCIENCE, 1985, 149 (01) :105-118
[4]   NITRIDATION OF POLYCRYSTALLINE TITANIUM AS STUDIED BY INSITU ANGLE-RESOLVED X-RAY PHOTOELECTRON-SPECTROSCOPY [J].
ERMOLIEFF, A ;
BERNARD, P ;
MARTHON, S ;
WITTMER, P .
SURFACE AND INTERFACE ANALYSIS, 1988, 11 (11) :563-568
[5]   QUANTITATIVE PHOTO ELECTRON-SPECTROSCOPY OF METALLIC COMPOUNDS [J].
HALBRITTER, J ;
LEISTE, H ;
MATHES, HJ ;
WALK, P ;
WINTER, H .
SOLID STATE COMMUNICATIONS, 1988, 68 (12) :1061-1064
[6]  
HIEU NV, 1984, APPL SURF SC, V20, P186, DOI 10.1016/0378-5963(84)90338-6
[7]   PHOTOEMISSION-STUDY OF THE ELECTRONIC-STRUCTURE OF STOICHIOMETRIC AND SUBSTOICHIOMETRIC TIN AND ZRN [J].
HOCHST, H ;
BRINGANS, RD ;
STEINER, P ;
WOLF, T .
PHYSICAL REVIEW B, 1982, 25 (12) :7183-7191
[8]   NOVEL SUBMICROMETER MOS DEVICES BY SELF-ALIGNED NITRIDATION OF SILICIDE [J].
KANEKO, H ;
KOYANAGI, M ;
SHIMIZU, S ;
KUBOTA, Y ;
KISHINO, S .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1986, 33 (11) :1702-1709
[9]   X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES OF THIN-FILMS OF TINX HAVING DIFFERENT ANNEALING HISTORIES [J].
KAUFHERR, N ;
LICHTMAN, D .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (05) :1969-1972
[10]   VACANCY EFFECTS IN THE X-RAY PHOTOELECTRON-SPECTRA OF TINX [J].
PORTE, L ;
ROUX, L ;
HANUS, J .
PHYSICAL REVIEW B, 1983, 28 (06) :3214-3224