BARRIERS AGAINST COPPER DIFFUSION INTO SILICON AND DRIFT THROUGH SILICON DIOXIDE

被引：186

作者：

WANG, SQ

机构：

来源：

关键词：

D O I：

10.1557/S0883769400047710

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

[No abstract available]

引用

页码：30 / 40

页数：11

共 72 条

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