AL METALLIZATION BY IONIZED-CLUSTER BEAM DEPOSITION AND EPITAXY

被引：7

作者：

YAMADA, I

INOKAWA, H

FUKUSHIMA, K

TAKAGI, T

机构：

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1985年 / 7-8卷 / MAR期

关键词：

D O I：

10.1016/0168-583X(85)90491-4

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

收藏

页码：900 / 905

页数：6

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共 11 条

[1] Chu W.-K., 1978, BACKSCATTERING SPECT, P223
[2] OPTICAL CONSTANTS AND REFLECTANCE AND TRANSMITTANCE OF EVAPORATED ALUMINUM IN VISIBLE AND ULTRAVIOLET
HASS, G
WAYLONIS, JE
[J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1961, 51 (07) : 719 - &
[3] ITOH K, 1984, 1984 IEEE INT SOL ST
[4] EVOLUTION AND CURRENT STATUS OF ALUMINUM METALLIZATION
LEARN, AJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (06) : 894 - 906
[5] SUZUKI S, 1984, 1984 IEEE INT SOL ST
[6] EFFECT OF GROWTH TEMPERATURE ON SI MBE FILM
TABE, M
ARAI, K
NAKAMURA, H
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (04) : 703 - 708
[7] EVALUATION OF METAL AND SEMICONDUCTOR-FILMS FORMED BY IONIZED-CLUSTER BEAM DEPOSITION
TAKAGI, T
YAMADA, I
SASAKI, A
[J]. THIN SOLID FILMS, 1976, 39 (DEC) : 207 - 217
[8] ION-SURFACE INTERACTIONS DURING THIN-FILM DEPOSITION
TAKAGI, T
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1984, 2 (02): : 382 - 388
[9] SLT DEVICE METALLURGY AND ITS MONOLITHIC EXTENSION
TOTTA, PA
SOPHER, RP
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1969, 13 (03) : 226 - &
[10] EFFECT OF TEXTURE AND GRAIN-STRUCTURE ON ELECTROMIGRATION IN AL-0.5-PERCENT CU THIN-FILMS
VAIDYA, S
SINHA, AK
[J]. THIN SOLID FILMS, 1981, 75 (03) : 253 - 259