SUBSTRATE HEATING RATES FOR PLANAR AND CYLINDRICAL-POST MAGNETRON SPUTTERING SOURCES

被引：63

作者：

THORNTON, JA

LAMB, JL

机构：

[1] CALTECH,JET PROP LAB,PASADENA,CA 91109

[2] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801

来源：

THIN SOLID FILMS | 1984年 / 119卷 / 01期

关键词：

D O I：

10.1016/0040-6090(84)90160-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：87 / 95

页数：9

共 14 条

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ANDERSEN, HH .

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[2]

CHOPRA KL, 1969, THIN FILM PHENOMENA, P312

[3] COMPRESSIVE STRESS AND INERT-GAS IN MO FILMS SPUTTERED FROM A CYLINDRICAL POST MAGNETRON WITH NE, AR, KR, AND XE [J].

HOFFMAN, DW ;

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (01) :380-383

[4] INTERNAL-STRESSES IN CR, MO, TA, AND PT FILMS DEPOSITED BY SPUTTERING FROM A PLANAR MAGNETRON SOURCE [J].

HOFFMAN, DW ;

THORNTON, JA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03) :355-358

[5]

PENFOLD AS, 1977, INTERNAL MEMO TELIC

[6] SPUTTERING EFFICIENCY OF AMORPHOUS SUBSTANCES [J].

SIGMUND, P .

CANADIAN JOURNAL OF PHYSICS, 1968, 46 (06) :731-&

[7]

Thornton J.A., 1978, THIN FILM PROCESS, V4, P75

[8] INTERNAL-STRESSES IN METALLIC-FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING [J].

THORNTON, JA ;

TABOCK, J ;

HOFFMAN, DW .

THIN SOLID FILMS, 1979, 64 (01) :111-119

[9] SUBSTRATE HEATING IN CYLINDRICAL MAGNETRON SPUTTERING SOURCES [J].

THORNTON, JA .

THIN SOLID FILMS, 1978, 54 (01) :23-31

[10] INTERNAL-STRESSES IN AMORPHOUS-SILICON FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING USING NE, AR, KR, XE, AND AR+H2 [J].

THORNTON, JA ;

HOFFMAN, DW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02) :203-207

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